Applied Materials’ new PROVision® 3E eBeam metrology system enables a new playbook for patterning control by combining nanometer resolution, high speed and through-layer imaging to give engineers the millions of datapoints they need to correctly pattern the most advanced chip designs.
Applied Materials’ new PROVision® 3E eBeam metrology system enables a new playbook for patterning control by combining nanometer resolution, high speed and through-layer imaging to give engineers the millions of datapoints they need to correctly pattern the most advanced chip designs.